TERA-Fab® E series

The world’s first commercial beam pen lithography tool for maskless photolithography with diffraction-unlimited resolution.
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 Key Features

 
 
Experience the Power of E Light
Powered by an advanced light engine, TERA-Fab E series delivers light to a sample in multiple wavelength options. With an unrivaled uniformity across the projection area, TERA-Fab E series maintains precision even at higher intensity levels.
 
Pattern Without Limits
Create patterns and structures with diffraction-unlimited dimensions as small as 250 nm by operating the E series in the beam pen lithography mode or microscale resolution by using the machine as a maskless photolithography tool without a tip array.
 
High Throughput Without a Mask
Beam pen arrays comprise 10,000s of probes, each of which can be independently controlled with the light engine to write truly arbitrary patterns over square millimeter to centimeter areas in parallel.
 
Spend Time Printing, Not Aligning
TERA-Fab E series eliminates the tedious and error-prone alignment process from your experiment. With an accurate and precise automatic alignment routine, M series lets you set up and begin printing faster than ever before.
 
Uncompromised Nanoprecision
Built with a high-end piezo stage, the M series allows the user to print inks onto surfaces with exceptional consistency and reliability.

M series controls motion in <100nm step sizes across a 100µm range in three dimensions, giving you the ability to create features at any location over centimeter scale areas with supreme precision.
 
Nanofabricate Like a Pro
Simple and intuitive design of the hardware and software allows users of any experience level to begin nanofabricating in no time. TERA-Fab OSe neatly packages all control parameters exactly where you need them.
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 Applications

Microfluidic DevicesRapidly design and fabricate microfluidic channel molds using conventional positive or negative photoresists outside of the cleanroom.

Microfluidic Devices

Rapidly design and fabricate microfluidic channel molds using conventional positive or negative photoresists outside of the cleanroom.

3D BioprintingGenerate complex hydrogel scaffolds via ECM photo polymerization to create in vitro platforms with sub-cellular resolution.

3D Bioprinting

Generate complex hydrogel scaffolds via ECM photo polymerization to create in vitro platforms with sub-cellular resolution.

Grayscale LithographyPattern complex features with varied depths using dynamic exposure and reduced light intensity.

Grayscale Lithography

Pattern complex features with varied depths using dynamic exposure and reduced light intensity.

 

 

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Technical Specifications

Stage Optics Features Software
X-Y scan range (closed loop) 100μm x 100μm typ., 95μm minimum
Z travel range (closed loop) 100μm typ., 95μm minimum
X-Y-Z tolerance (closed-loop) 1nm typ.
Repeatability <10nm typ.
Manual X-Y positioning stage 12.7mm x 12.7mm travel range
Motorized Z axis 12mm travel range, bi-directional repeatability, 0.75μm bidirectional repeatability, 2mm/s maximum speed
ΘX and ΘY 2-axis angular positioning ±3.5° angular range, 4x10-5° angular resolution
Motorized X-Y motion 50mm x 50mm travel range, bi-directional repeatibility: 1μm
Motorized Z motion 50mm travel range, bi-directional repeatibility: <50μm, maximum speed: 3.0mm/s
Digital LightProcessing (DLP) DLP5500 0.55" XGA Chipset, 1024 x 768 resolution
Light Sources UV LED Light Engine (405nm) 2.4-2.8W, Green LED Light Engine (532nm) 2.5W, additional 460 and 365 options available
5x Objective M Plan APO 34mm working distance, 2μm resolving power, additional objective lenses available (10x, 20x, 50x)
Field of View 1.28mm x 0.96mm
CMOS camera FLIR 12 MP (4000 x 3000) CCD, 0.74cm x 0.55cm sensor size, 1.85μm x 1.85μm pixel size
  • Easy to access noise isolation enclosure
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  • Integrated damping and vibration isolation
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  • Magnetic sample holder capable of accommodating up to 20mm x 20mm samples
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    X-Y-Z piezo scanning stage
    • Set movement speed for each axis individually or all axees within 1-100microns/seconds range
    • Move each axis individually or all axes to an absolute position or relative to current position within 100μm range
    Z positioning of sample stage
    • Set movement speed of the long travel Z motor in a 0 to 2mm/s range
    • Move sample stage to an absolute position or relative to current position within 25mm range
    • Tilt pen array in ΘX and ΘY directions by a specified angle with a minimum increment of 4x10-5°

    Stage leveling
    • Automated pen array engagement with a substrate
    • Real-time 4 corner contact monitor for manual alignment of pen array to the substrate plane
    • Automated alignment of pen array to the substrate plane with our patented feedback-controlled algorithm

    Patterning
    • Creation of orthogonal dot patterns
    • User specified dot spacing, dwell time, light exposure time, light patterns, and patterning speed
    • Ability to save, load, and merge generated orthogonal patterns
    • Pattern preview window
    • Capability to define a custom pattern by loading an image; automatically generated sequence of patterns; user specified dot spacing, light exposure time, and patterning speed
    Optics
    • Integrated digital zoom control
    • Integrated light intensity control
    • Ability to control the illumination area by specifying the number of active DMD mirrors